【Product introduction】

This product contains Al2O3 particles as the main abrasive particles and a serial of chemical reagents including the oxidizer, corrosive, surfactant and stabilizing agent, etc. It provides higher material removeal rate, and meanwhile sharply reduces the average roughness of the hard disk substrate.

【Primary application】

Mainly used in hard dish substrate coarse polishing field

【Main parameters】

This product consists of two original liquids;

Liquid A: particle diameter 50nm, specific gravity 1.1~1.25;

Liquid B: PH 2~4, specific gravity1.0~1.2

【Technical index】

Material removal rate (MRR)＞0.8 μm;

Average Roughness (Ra) of polished surface ＜ 2;

The polished surface presents no defects including corrosive point、pit、scratch、contamination.

【Using method】

Mixing Liquid A with the mixture of Liquid B and deionized water under string condition in the ratio of 1:1:5 (A/B/ deionized water).

【Packaging】

20kg/barrel

【Storage】

Storage temperature: 10～65℃;

ventilate and avoid direct sunlight;

shelf life :one year.